LCP Laser Cut Processing

Laser Scribing

Separate cleanly and precisely

Predetermined breaking points for depanelization

Especially when using hard-brittle materials such as ceramics made of aluminum oxide, silicon nitride or low-temperature co-fired ceramics (LTCC) for the production of circuit carriers in hybrid electronics, the production in a so-called panel arrangement, which means the arrangement of several individual circuits on a raw substrate or wafer for joint production as a batch, has proven itself.

With the help of laser scribing, scribe lines are inserted on the substrate. This bullet hole or these bullet holes are visible in the form of closely spaced blind holes or notches. A blind hole is only lasered to a certain depth. This creates predetermined breaking points while avoiding a breakthrough. This weakening of the material serves as a perforation line. After the production run, breaking along these scribe lines enables the mechanical separation of the multiple panel into the individual components.

With the pearl chain-like stringing of blind holes, both the penetration depth and the spacing or overlapping of the individual blind holes can be determined. If there is a large overlap, this is referred to as the production of a notch trench, which in turn has a strong resemblance to the notch trenches introduced during the punching of unfired ceramic substrates (green state). This processing technology enables more efficient production of individual parts by means of a panel arrangement not only for ceramic materials, but also for glasses, silicon and even some metals.

Laser processing of ceramics and other materials

Due to its special properties in terms of thermal conductivity and electrical insulation, ceramics are increasingly being used in electronic circuits. Different types of lasers are used for laser processing, such as laser scribing, notching, drilling, structuring and cutting of ceramics and other materials:

  • CO2 lasers or gas lasers operate in the infrared range at wavelengths of approximately 9 µm to 11 µm. High output power and comparatively high efficiency are crucial.
     
  • YAG lasers or solid-state lasers are used for finely structured materials. These are characterized by a smaller focal point and a correspondingly narrower cutting gap.
     
  • Ultra-short pulse lasers (USP lasers) offer the advantage of particularly short laser pulses. The result is extremely precise cutting edges and low material stress.

Wafer dicing, abrasive cutting or sawing continue to be used as classic processing variants for hard-brittle materials, for small components under 5x5 mm2 also in combination with laser processing.

General Technical Details

The advantages of laser scribing in detail:

  • non-contact process, no micro-cracks in the material
  • minimal heat-affected zone and high scribing speed
  • high flexibility because of individually determinable scribing depth and distance
  • optimum area utilisation and material yield due to smallest possible joint widths
  • clean, precise cutting with high quality of the individual elements

New processing method

NextGen Scribing: Cold. Clean. Precise.

With the new process "NextGen Laser Scribing" using USP laser technology, a new technology is now being utilized that eliminates the disadvantages of the two previous standard methods (CO2 laser and YAG laser) and thereby scores points in terms of quality, especially when product quality requires it. For example, this is the case when processing already printed, pre-structured, or even already populated panel substrates.

Technology comparison of Long Pulse and Ultra-short Pulse Laser Processing

  • Technology & Laser Type

    Standard Process

    Long pulse laser processing (mostly CO2 laser)

    New Process "NextGen Laser Scribing"

    USP technology (Ultra-short pulse)

  • Processing Method

    Standard Process

    Introducing lined-up blind holes for material weakening

    New Process "NextGen Laser Scribing"

    Introducing continuous lines up to a certain depth

  • Pulse Length & Regime

    Standard Process

    ms, µs and ns range (thermally dominated regime)

    New Process "NextGen Laser Scribing"

    ps and fs range (very short interaction duration and high energy density with significantly smaller beam focus)

  • Mechanism of Action

    Standard Process

    Melting of material and subsequent expulsion using a gas flow

    New Process "NextGen Laser Scribing"

    "Cold" processing; material is directly sublimated/evaporated

  • Process Flow

    Standard Process

    ➔ Unprocessed ceramic substrate
    ➔ laser processing
    post-processing (cleaning)
    ➔ printing/assembly by customer

    New Process "NextGen Laser Scribing"

    ➔ Already printed/assembled ceramic substrates
    ➔ laser processing
    ➔ customer

  • Post-Processing

    Standard Process

    Elaborate post-processing (cleaning) required

    New Process "NextGen Laser Scribing"

    No post-processing necessary (completely omitted)

  • Quality & Surface Effects

    Standard Process

    Melt beads, ejections, adhesion, burrs, and microcracks can occur

    New Process "NextGen Laser Scribing"

    No melt residues, no burrs, hardly any material damage

  • Precision & Material Utilization

    Standard Process

    Standard scribe lines

    New Process "NextGen Laser Scribing"

    Significantly more delicate structures; narrower notch lines allow up to 25% higher utilization of the substrate surface

  • Overall Quality

    Standard Process

    High manufacturing quality

    New Process "NextGen Laser Scribing"

    Higher component quality in direct comparison to standard processes

The new “NextGen” process combines efficiency, cleanliness, and yield in an optimized procedure. During “cold” ablation, no heat is introduced into the material, which prevents potential material damage and microcracks. Due to the physical effect of sublimation, the material also evaporates directly, meaning no disruptive melt residues or burrs are formed. This completely eliminates the time-consuming post-processing required by the standard process. At the same time, the significantly narrower kerf lines enable finer structuring, allowing up to 25% more usable area to be obtained from the same substrate.

Technical details of the “NextGen” process

The advantages of USP laser scribing in detail:

- Contactless process
- Optimal area utilization and material yield due to the smallest possible kerf width
- "Cold ablation" - little to no thermal damage to the material
        ➔ No microcracks, stresses, or breakouts
- No residues, ejections, melt adhesions, or burr formation
        ➔ No mechanical post-processing
- No damage to neighboring structures
- No vitrification effects
- Extremely high reproducibility 
- Minimal layer ablation is in the micrometer range
- Large working distance enables problem-free processing of 3D structures

Processing possibilities

  • Processing space typically 115 x 115 x 0.5 mm (4“ x 4“)
  • Material thicknesses 0.12–1 mm, depending on material and processing geometry
  • Micro-machining of all material types possible
  • Typical materials in the production of circuit carriers:
    • Aluminum oxide (Al2O3, sapphire)
    • Aluminum nitride (AlN)
    • Silicon (Si) and silicon nitride (Si3N4)
    • Sintered silicon carbide (SSiC)
    • Recrystallized silicon carbide (RSiC)
    • Glass (ceramic), quartz
    • Ceramic printed circuit boards or multilayer (LTCC)
  • Tolerances ± 0.05 to ± 0.02 mm

What is laser scribing used for?

Laser scribing of technical ceramicsplays a key role in the manufacture of hybrid and high-performance electronics. Due to its enormous material-saving precision, the method is indispensable in numerous high-tech industries.

Key industries for laser scribing:

  • Automotive Industry: Battery management, steering wheel control
  • Aerospace: Level sensor technology for operating resources, flap control
  • Medical Technology: Gas analysis for respiration, cell cultures
  • Sensor Technology: Hall sensor technology for magnetic field measurement
  • Optoelectronics: Components for LIDAR applications
  • Measurement and Control Technology: HF/UHF circuit electronics for radar applications, pressure sensor technology for HVAC
  • Industrial and Consumer Electronics: Ceramic membrane for high-performance microphones
  • Semiconductor Industry: Electrostatic chucks for wafer handling

Applications of laser scribing:

  • For the singulation of wafers in the semiconductor industry
  • For separating already printed, sputtered ceramic base bodies, for example Low-Temperature Co-fired Ceramics (LTCC), into individual elements
  • For separating panel arrays on thick-film/thin-film substrates
  • For structuring IR filter elements
  • Friction rails
  • Ceramic spacers, washers, diffusers, and panel substrates
  • Ceramic insulating washers consisting of oxide ceramics such as aluminum oxide (Al2O3), aluminum nitride (AlN), silicon carbide (SiC), silicon nitride (Si3N4)

Download data sheets

  • pdf
    Ceramics Machining
    256 KB
  • pdf
    Design Guideline Ceramics
    465 KB
  • pdf
    Ultra Short Pulse Machining
    308 KB
  • pdf
    Data Transfer
    560 KB

Further services for you

Also discover our other diverse processing technologies. We manufacture precise and individual components according to your specifications - from laser cutting and laser structuring to wafer dicing and precision bending.

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